Characteristics of the Series Resistance Extracted From Si Nanowire FETs Using the $Y$-Function Technique-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Characteristics of the Series Resistance Extracted From Si Nanowire FETs Using the $Y$-Function Technique

Published:2010-03 Issue:2 Volume:9 Page:212-217
ISSN:1536-125X
Container-title:IEEE Transactions on Nanotechnology
language:
Short-container-title:IEEE Trans. Nanotechnology

Author:

Rock-Hyun Baek ,Chang-Ki Baek ,Sung-Woo Jung ,Yun Young Yeoh ,Dong-Won Kim ,Jeong-Soo Lee ,Kim D.M.,Yoon-Ha Jeong

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Computer Science Applications

Link

http://xplorestaging.ieee.org/ielx5/7729/5427239/05170055.pdf?arnumber=5170055

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sensitivity of Inner Spacer Thickness Variations for Sub-3-nm Node Silicon Nanosheet Field-Effect Transistors;Nanomaterials;2022-09-26

2. Quantum Transport of Sub-10 nm Monolayer WGe2N4 Transistors;ACS Applied Electronic Materials;2021-10-28

3. Gate-All-Around FETs: Nanowire and Nanosheet Structure;Nanowires - Recent Progress;2021-07-14

4. Sensitivity of Source/Drain Critical Dimension Variations for Sub-5-nm Node Fin and Nanosheet FETs;IEEE Transactions on Electron Devices;2020-01

5. Device Design Guideline of 5-nm-Node FinFETs and Nanosheet FETs for Analog/RF Applications;IEEE Access;2020

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP