Field-drifting resonant tunneling through a-Si:H/a-Si/sub 1-x/C/sub x/:H quantum wells at different locations of the i-layer of a p-i-n structure
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx1/16/1569/00040966.pdf?arnumber=40966
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Carrier confinement effect-driven channel design and achievement of robust electrical/photostability and high mobility in oxide thin-film transistors;Journal of Materials Chemistry C;2016
2. Electrical Properties of the Multilayer Structures Based on Ultrathin Diamond-Like Carbon Films;MRS Proceedings;1996
3. Irregularities in current-voltage characteristics of hydrogenated-amorphous-silicon-based barrier structures: Resonant tunnelling against hopping and filamentary conduction through the barriers;Philosophical Magazine B;1994-11
4. Anomalous conductivity phenomenon and quantum size effects in a new microstructure‐modulated superlattice;Applied Physics Letters;1993-11-15
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