Key Feature Identification for Monitoring Wafer-to-Wafer Variation in Semiconductor Manufacturing-Reference-Cited by-同舟云学术

Key Feature Identification for Monitoring Wafer-to-Wafer Variation in Semiconductor Manufacturing

Author:

Fan Shu-Kai S.¹^ORCID,Hsu Chia-Yu¹^ORCID,Tsai Du-Ming²^ORCID,Chou Mabel C.³^ORCID,Jen Chih-Hung⁴^ORCID,Tsou Jen-Hsuan¹

Affiliation:

1. Department of Industrial Engineering and Management, National Taipei University of Technology, Taipei, Taiwan

2. Department of Industrial Engineering and Management, Yuan Ze University, Taoyuan, Taiwan

3. NUS Business School and the Institute of Operations Research and Analytics, National University of Singapore, Singapore

4. Department of Information Management, Lunghwa University of Science and Technology, Guishan, Taoyuan, Taiwan

Funder

Ministry of Science and Technology, Taiwan

Joint Research Program

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Control and Systems Engineering

Link

Reference43 articles.

5. Assessment of regions at risk from coronary X-ray imaging by Kohonen’s map;coppini;Proc Comput Cardiol,1995

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