Discrete Active Disturbance Rejection Control for Semiconductor Manufacturing Processes With Dynamic Models
Author:
Affiliation:
1. School of Electrical Engineering, Shanghai Dianji University, Shanghai, China
2. School of Electrical Engineering and Automation, Anhui University, Hefei, China
Funder
National Natural Science Foundation of China
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/66/10299929/10215360.pdf?arnumber=10215360
Reference34 articles.
1. Output Disturbance Observer Structure Applied to Run-to-Run Control for Semiconductor Manufacturing
2. Age-based double EWMA controller and its application to CMP processes
3. Applying Discrete-Time Proportional Integral Observers for State and Disturbance Estimations
4. SISO run-to-run feedback controller using triple EWMA smoothing for semiconductor manufacturing processes
5. An Extended State Observer-Based Run to Run Control for Semiconductor Manufacturing Processes
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