Decomposition of Vertical and Lateral Charge Loss in Long-term Retention of 3-D NAND Flash Memory
Author:
Affiliation:
1. Pohang University of Science and Technology,Department of Electrical Engineering,Pohang,South Korea,37673
2. Gyeongsang National University,Department of Electrical Engineering,Jinju,South Korea,52828
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10117589/10117581/10117868.pdf?arnumber=10117868
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5. Analysis and Compact Modeling of Fast Detrapping From Bandgap-Engineered Tunneling Oxide in 3-D NAND Flash Memories
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2. Influence of high-temperature thermal annealing on paramagnetic point defects in silicon-rich silicon nitride films formed in a single-wafer-type low-pressure chemical vapor deposition reactor;Journal of Vacuum Science & Technology A;2024-07-24
3. Improvement of Retention Characteristics Using Doped SiN Layer Between WL Spaces in 3D NAND Flash;IEEE Access;2024
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