Near-ideal I-V characteristics of GaInP/GaAs heterojunction bipolar transistors
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx1/55/4974/00192817.pdf?arnumber=192817
Cited by 60 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Accurate and efficient analysis of the upward heat flow in InGaP/GaAs HBTs through an automated FEM‐based tool and Design of Experiments;International Journal of Numerical Modelling: Electronic Networks, Devices and Fields;2018-11-28
2. In0.49Ga0.51P/GaAs heterojunction bipolar transistors (HBTs) on 200 mm Si substrates: Effects of base thickness, base and sub-collector doping concentrations;AIP Advances;2018-11
3. MOCVD growth of InGaP/GaAs heterojunction bipolar transistors on 200 mm Si wafers for heterogeneous integration with Si CMOS;Semiconductor Science and Technology;2018-10-12
4. Simulation comparison of InGaP/GaAs HBT thermal performance in wire-bonding and flip-chip technologies;Microelectronics Reliability;2017-11
5. Recombination by band-to-defect tunneling near semiconductor heterojunctions: A theoretical model;Journal of Applied Physics;2016-10-04
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