On the Fly Ellipsometry Imaging for Process Deviation Detection-Reference-Cited by-同舟云学术

On the Fly Ellipsometry Imaging for Process Deviation Detection

Published:2022-08 Issue:3 Volume:35 Page:432-438
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Alcaire T.¹^ORCID,Le Cunff D.¹^ORCID,Soulan S.²,Tortai J.-H.²

Affiliation:

1. STMicroelectronics, Crolles, France

2. CEA-LETI, LTM/CNRS, Grenoble, France

Funder

Electronic Component Systems for European Leadership Joint Undertaking Project MADEin4

European Union Horizon 2020 Research and Innovation Program and, Austria, Belgium, France, Germany, Hungary, Ireland, Italy, The Netherlands, Romania, and Sweden

French ANR Program Investissements d’Avenir EQUIPEX

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/66/9851188/09796990.pdf?arnumber=9796990

Reference6 articles.

1. Improvements of phase‐modulated ellipsometry

2. Fast, Noncontact, Wafer-Scale, Atomic Layer Resolved Imaging of Two-Dimensional Materials by Ellipsometric Contrast Micrography

3. Spectroscopic Ellipsometry Imaging for Process Deviation Detection via Machine Learning Approach

4. Full Wafer Stress Metrology for Dielectric Film Characterization: Use Case

5. Novel implementations of scatterometry for lithography process control

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A review on optical characterization of refractive index in photonic related devices and applications;Journal of Physics D: Applied Physics;2024-09-10

2. Application of Spectral Ellipsometry for Dielectric, Metal and Semiconductor Films in Microelectronics Technology;Микроэлектроника;2024-07-17

3. Application of Spectral Ellipsometry for Dielectric, Metal, and Semiconductor Films in Microelectronics Technology;Russian Microelectronics;2024-02

4. Improving the accuracy and precision of OCD measurement by systematic error correction in self-interference pupil ellipsometry;Optical Measurement Systems for Industrial Inspection XIII;2023-08-15