Spectroscopic Ellipsometry Imaging for Process Deviation Detection via Machine Learning Approach-Reference-Cited by-同舟云学术

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Spectroscopic Ellipsometry Imaging for Process Deviation Detection via Machine Learning Approach

Published:2020-08 Issue: Volume: Page:
ISSN:
Container-title:2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
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Author:

Alcaire Thomas,Cunff Delphine Le,Gredy Victor,Tortai Jean-Herve

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9180248/9185190/09185349.pdf?arnumber=9185349

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Application of Spectral Ellipsometry for Dielectric, Metal and Semiconductor Films in Microelectronics Technology;Микроэлектроника;2024-07-17

2. Application of Spectral Ellipsometry for Dielectric, Metal, and Semiconductor Films in Microelectronics Technology;Russian Microelectronics;2024-02

3. 空间调制型偏振检测技术研究现状及发展趋势;Acta Optica Sinica;2023

4. On the Fly Ellipsometry Imaging for Process Deviation Detection;IEEE Transactions on Semiconductor Manufacturing;2022-08

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