Insights into device and material origins and physical mechanisms behind cross temperature in 3D NAND

Author:

Pesic Milan1,Beltrando Bastien1,Rollo Tommaso1,Zambelli Cristian2,Padovani Andrea3,Micheloni Rino4,Maji Rita3,Enman Lisa1,Saly Mark1,Bae Yang Ho1,Kim Jung Bae1,Yim Dong Kil1,Larcher Luca1

Affiliation:

1. Applied Materials Inc.,Santa Clara,CA,USA

2. Università degli Studi di Ferrara,Dipartimento di Ingegneria,Ferrara,Italy

3. DISIMI, Università di Modena e Reggio Emilia,Reggio Emilia,Italy

4. Avaneidi srl,Saronno,VA,Italy

Publisher

IEEE

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Exploring Cross-Temperature Reliability in 3D NAND Through Layer-Dependent Bit Error Analysis;2024 IEEE 8th International Test Conference India (ITC India);2024-07-21

2. Cross-Temperature Reliability of 3D NAND: Cell-to-Cell Variability Analysis and Countermeasure;2024 IEEE International Reliability Physics Symposium (IRPS);2024-04-14

3. Low-PBTS defect-engineered high-mobility metal-oxide BEOL transistors;2024 IEEE International Reliability Physics Symposium (IRPS);2024-04-14

4. Blocking Oxide Material Engineering to Improve Retention Loss in 3D NAND: a Modeling Process Optimization Study;2024 IEEE International Reliability Physics Symposium (IRPS);2024-04-14

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