Low-Temperature Polymer Hybrid Bonding with Nanoparticulated Cu and Photosensitive Acrylic Adhesive
Author:
Affiliation:
1. Daicel Corporation,Osaka,Japan
2. Daicel Corporation,Hyogo,Japan
3. Tohoku MicroTec (T-Micro) Co., Ltd.,Miyagi,Japan
4. Tohoku University,Department of Mechanical Systems Engineering,Miyagi,Japan
5. Daicel Corporation,Tokyo,Japan
Funder
Research and Development
Technology Development
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx8/10564841/10564831/10565006.pdf?arnumber=10565006
Reference10 articles.
1. Three-dimensional integration scheme with a thermal budget below 300°C
2. Superb sinterability of the Cu paste consisting of bimodal size distribution Cu nanoparticles for low-temperature and pressureless sintering of large-area die attachment and the sintering mechanism
3. A*STAR’s Institute of Microelectronics partners eight semiconductor companies in chip-to-wafer hybrid bonding;Institute of Microelectronics, Press Release,2021
4. Development of a Temporary Bonding Tape Having over 300 degC Thermal Resistance for Cu-Cu Direct Bonding
5. Fabricating 3D integrated CMOS devices by using wafer stacking and via-last TSV technologies
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