Adaptive Online Time-Series Prediction for Virtual Metrology in Semiconductor Manufacturing
Author:
Affiliation:
1. Gauss Labs,Seoul,South Korea
2. Gauss Labs,Palo Alto,United States
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10121052/10121025/10121099.pdf?arnumber=10121099
Reference8 articles.
1. Competitive on-line linear regression;vovk;Advances in neural information processing systems,0
2. Understanding and Improving Virtual Metrology Systems Using Bayesian Methods
3. Dynamic-Moving-Window Scheme for Virtual-Metrology Model Refreshing
4. Recurrent feature-incorporated convolutional neural network for virtual metrology of the chemical mechanical planarization process;lee;Journal of Intelligent Manufacturing,2018
5. Efficient learning algorithms for changing environments
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The Value of In-Line Metrology for Advanced Process Control: AM: Advanced Metrology;2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2024-05-13
2. Model aggregation for virtual metrology in high-volume manufacturing;Metrology, Inspection, and Process Control XXXVIII;2024-04-10
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