Understanding and Improving Virtual Metrology Systems Using Bayesian Methods-Reference-Cited by-同舟云学术

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Understanding and Improving Virtual Metrology Systems Using Bayesian Methods

Published:2022-08 Issue:3 Volume:35 Page:511-521
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Lang Christopher I.¹^ORCID,Sun Fan-Keng¹,Veerasingam Ramana²,Yamartino John²,Boning Duane S.³^ORCID

Affiliation:

1. Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, MA, USA

2. Lam Research Corporation, Fremont, CA, USA

3. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, USA

Funder

Lam Research Corporation

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/66/9851188/09763074.pdf?arnumber=9763074

Reference35 articles.

1. The expectation-maximization algorithm

2. Observation Influence Diagnostic of a Data Assimilation System

3. STATIONARY PROCESSES THAT LOOK LIKE RANDOM WALKS— THE BOUNDED RANDOM WALK PROCESS IN DISCRETE AND CONTINUOUS TIME

4. A general semiconductor press modeling framework

5. On the effectiveness of weighted moving windows: Experiment on linear regression based software effort estimation

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Virtual metrology for enabling zero-defect manufacturing: a review and prospects;The International Journal of Advanced Manufacturing Technology;2024-01-09

2. Adaptive Online Time-Series Prediction for Virtual Metrology in Semiconductor Manufacturing;2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2023-05-01

3. Intelligent Optimization of Dosing Uniformity in Ion Implantation Systems;IEEE Transactions on Semiconductor Manufacturing;2022-08

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