Development of a Gas Jet-Type Z-Pinch EUV Light Source for Next-Generation Lithography-Reference-Cited by-同舟云学术

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Development of a Gas Jet-Type Z-Pinch EUV Light Source for Next-Generation Lithography

Published:2005 Issue:9 Volume:81 Page:647-648
ISSN:0918-7928
Container-title:Journal of Plasma and Fusion Research
language:en
Short-container-title:J. Plasma Fusion Res.

Author:

SONG Inho¹,MOHANTY R. Smruti¹,WATANABE Masato¹,KAWAMURA Toru¹,OKINO Akitoshi¹,HORIOKA Kazuhiko¹,HOTTA Eiki¹

Affiliation:

1. Department of Energy Sciences, Tokyo Institute of Technology

Publisher

Japan Society of Plasma Science and Nuclear Fusion Research

Link

http://www.jstage.jst.go.jp/article/jspf/81/9/81_9_647/_pdf

Reference7 articles.

1. [1] Http://www.sematech.org/resources/litho

2. [2] P. Marczuk et al., SPIE 5533, 145 (2004).

3. [3] R. Lebert et al., SPIE 4343, 215 (2001).

4. [4] N.R. Fornaciari et al., SPIE 4343, 226 (2001).

5. Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pulsed current wave shaping with a transmission line by utilizing superposition of a forward and a backward voltage wave for fast capillary Z-pinch discharge;Review of Scientific Instruments;2010-04

2. Influence of electrode separation and gas curtain on extreme ultraviolet emission of a gas jet z-pinch source;Applied Physics Letters;2006-07-24

3. Miniature hybrid plasma focus extreme ultraviolet source driven by 10kA fast current pulse;Review of Scientific Instruments;2006-04

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