Miniature hybrid plasma focus extreme ultraviolet source driven by 10kA fast current pulse
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2194587
Reference16 articles.
1. Ultimate Efficiency of Extreme Ultraviolet Radiation from a Laser-Produced Plasma
2. Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations
3. Extreme ultraviolet light sources for use in semiconductor lithography—state of the art and future development
4. Xenon-emission-spectra identification in the 5–20-nm spectral region in highly ionized xenon capillary-discharge plasmas
5. A novel fast capillary discharge system emitting intense EUV radiation
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