Developments of Basic Researches on Fluorocarbon Plasmas for Material Processing. 7. CFx Radical Creation and Destruction at Surfaces in Fluorocarbon Plasmas.-Reference-Cited by-同舟云学术

Developments of Basic Researches on Fluorocarbon Plasmas for Material Processing. 7. CFx Radical Creation and Destruction at Surfaces in Fluorocarbon Plasmas.

Published:1999 Issue:7 Volume:75 Page:821-829
ISSN:0918-7928
Container-title:Journal of Plasma and Fusion Research
language:en
Short-container-title:J. Plasma Fusion Res.

Author:

BOOTH Jean-Paul¹,CUNGE Gilles¹

Affiliation:

1. Laboratoire de Spectrométrie Physique,Université Joseph Fourier-Grenoble I/CNRS UMR 5588,BP 87,38402 St Martin d’Hères Cedex,France

Publisher

Japan Society of Plasma Science and Nuclear Fusion Research

Link

http://www.jstage.jst.go.jp/article/jspf/75/7/75_7_821/_pdf

Reference73 articles.

1. Mechanisms of etching and polymerization in radiofrequency discharges of CF4–H2, CF4–C2F4, C2F6–H2, C3F8–H2

2. [2] S. Pang and S. R. J. Brueck, Mat. Res. Soc. Symp. Proc. 17, 161 (1983).

3. Polymer deposition and etching mechanisms in C2F6 radio-frequency plasma as studied by laser-induced fluorescence

4. Polymerization for Highly Selective SiO2Plasma Etching

5. CFX(X=1–3)Radicals Controlled by On-Off Modulated Electron Cyclotron Resonance Plasma and Their Effects on Polymer Film Deposition

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3. Measurement techniques of radicals, their gas phase and surface reactions in reactive plasma processing;Applied Surface Science;2002-05

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