Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner-Reference-Cited by-同舟云学术

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Review of ultra-precision optical interferential grating encoder displacement measurement technology for immersion lithography scanner

Published:2019 Issue:9 Volume:27 Page:1909-1918
ISSN:1004-924X
Container-title:Optics and Precision Engineering
language:en
Short-container-title:光学精密工程

Author:

WANG Lei-jie 王磊杰,ZHANG Ming 张鸣,ZHU Yu 朱煜,YE Wei-nan 叶伟楠,YANG Fu-zhong 杨富中

Publisher

Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences

Subject

Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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4. Synthetic model of nonlinear errors in grating displacement measurement system;Optical Engineering;2022-06-17

5. An Absolute Linear Displacement Sensor Based on Orthogonal Dual Traveling Wave Magnetic Field;IEEE Sensors Journal;2022-03-15

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