MEASUREMENT OF CRITICAL EXPONENTS OF PLATINUM THIN FILMS-Reference-Cited by-同舟云学术

MEASUREMENT OF CRITICAL EXPONENTS OF PLATINUM THIN FILMS

Published:2003-02 Issue:01 Volume:10 Page:1-5
ISSN:0218-625X
Container-title:Surface Review and Letters
language:en
Short-container-title:Surf. Rev. Lett.

Author:

SALVADORI M. C.¹,MELO L. L.¹,CATTANI M.¹,MONTEIRO O. R.²,BROWN I. G.²

Affiliation:

1. Instituto de Física, Universidade de São Paulo, CP 66318, CEP 05315-970, São Paulo, SP, Brazil

2. Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA

Abstract

We have fabricated platinum thin films by metal plasma ion deposition on silicon substrates. The roughness of these films has been measured by a scanning tunneling microscope (STM) and we have determined the growth dynamics critical exponents.

Publisher

World Scientific Pub Co Pte Lt

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.worldscientific.com/doi/pdf/10.1142/S0218625X03004561

Reference24 articles.

1. Plasma synthesis of hard materials with energetic ions

2. Recent advances in surface processing with metal plasma and ion beams

3. Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing

4. Streaming metal plasma generation by vacuum arc plasma guns

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