Unique precursor delivery and control afforded by low-pressure pulsed-CVD process with ultrasonic atomization
Author:
Publisher
EDP Sciences
Subject
General Physics and Astronomy
Link
http://jp4.journaldephysique.org/10.1051/jp4:20013146/pdf
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Preparation of Magnéli phases of Ti27O52 and Ti6O11 films by laser chemical vapor deposition;Thin Solid Films;2010-09
2. Pulsed-Pressure MOCVD Science, Materials and Technology;ECS Transactions;2009-09-25
3. MOCVD of YSZ coatings using β-diketonate precursors;Journal of Alloys and Compounds;2009-02
4. Nanocrystalline ZrO2thin films on silicon fabricated by pulsed-pressure metalorganic chemical vapor deposition (PP-MOCVD);Journal of Materials Research;2008-08
5. Step coverage of thin titania films on patterned silicon substrate by pulsed-pressure MOCVD;Surface and Coatings Technology;2007-09
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