Pulsed-Pressure MOCVD Science, Materials and Technology

Abstract

Pulsed pressure processing from liquid MOCVD precursors has been studied over the past ten years. Extending the capabilities of CVD to applications like thermal barrier coatings, Solid Oxide Fuel Cells, and bio-integration coatings was the motivation for the original innovative concept. The systems engineering research has focused on development of a low-cost, high throughput method capable of providing high quality, uniform ceramic films on metal, ceramic or glass Pulsed pressure processing from liquid MOCVD precursors has been studied over the past ten years. Extending the capabilities of CVD to applications like thermal barrier coatings, Solid Oxide Fuel Cells, and bio-integration coatings was the motivation for the original innovative concept. The systems engineering research has focused on development of a low-cost, high throughput method capable of providing high quality, uniform ceramic films on metal, ceramic or glass objects with complex 3-D geometry. The MOCVD research has focused on using low-cost, low-hazard precursors to deposit the desired materials with the required properties. This paper reviews the fundamentals of the PP-MOCVD approach, the experience with precursors and thin films, and the advances of the system engineering toward several commercial applications.