Film formation from HMDSO: comparison of direct plasma injection with afterglow injection using an atmospheric pressure dielectric barrier discharge
Author:
Publisher
EDP Sciences
Subject
Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://www.epjap.org/10.1051/epjap/2017160478/pdf
Reference24 articles.
1. Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure
2. Expanding thermal plasma for low-k dielectrics: engineering the film chemistry by means of specific dissociation paths in the plasma
3. Deposition of tetramethylsilane on the glass by plasma-enhanced chemical vapor deposition and atmospheric pressure plasma treatment
4. Atmospheric rf plasma deposition of superhydrophobic coatings using tetramethylsilane precursor
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