Structural and optical properties of copper nitride thin films in a reactive Ar/N2magnetron sputtering system
Author:
Publisher
EDP Sciences
Subject
Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://epjap.epj.org/10.1051/epjap/2010040/pdf
Reference14 articles.
1. Structural and optical properties of silicon nitride film generated on Si substrate by low energy ion implantation
2. Numerical and experimental study of the contact resistance for high copper alloys in force domain 1–100 N
3. Study of the structure and electrical properties of the copper nitride thin films deposited by pulsed laser deposition
4. Effect of N2-Gas Partial Pressure on the Structure and Properties of Copper Nitride Films by DC Reactive Magnetron Sputtering
5. Copper nitride and tin nitride thin films for write‐once optical recording media
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