X-Ray Reflectivity Analysis in Evaluating Multilayer Thin Film Fabrication

Abstract

X-ray reflectivity technique is applied in evaluation of deposition of multilayer thin film fabrication process. Amorphous silicon carlbide (SiC) and carbon (rGO) was deposited alternatively on a glass substrate. Via X-ray reflectivity, every layer deposited can be analyzed, thus every flaws in defected layer can be figure out. This paper will explain further throughout the evaluation process. Deposition process carried out by radio frequency (RF) magnetron sputtering of 99% purity of silicon carbide (SiC) and carbon (C) as a target. Implementation of X-ray reflectivity technique had proven in fabricating better quality of thin film.