Technological Features of the Thick Tin Film Deposition by with Magnetron Sputtering Form Liquid-Phase Target-Reference-Cited by-同舟云学术

Technological Features of the Thick Tin Film Deposition by with Magnetron Sputtering Form Liquid-Phase Target

Published:2018-09 Issue: Volume:781 Page:8-13
ISSN:1662-9795
Container-title:Key Engineering Materials
language:
Short-container-title:KEM

Author:

Makarova Mariya¹,Moiseev Konstantin¹,Nazarenko Alexander²,Luchnikov Petr²,Dalskaya Galina²,Katakhova Natalya²

Affiliation:

1. Bauman Moscow State Technical University

2. Moscow Technological University

Abstract

Technological features of obtaining of tin films in a vacuum by liquid-phase target magnetron sputtering were reviewed. With high deposition rate the white color tin coating with amorphous structure is formed on the substrate. X-ray microanalysis of the obtained tin films showed the presence of micro-and nanoparticles of an impurity of the crucible material in the structure of the films. The use of the tantalum crucible with liquid-phase target magnetron sputtering with deposition rate of 3.2 μm / min allows obtaining ultra-pure, continuous, homogeneous tin film on a stationary substrate without impurity material of the crucible.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

https://www.scientific.net/KEM.781.8.pdf

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