Affiliation:
1. Kansai Electric Power Co., Inc.
2. Central Research Institute of Electric Power Industry (CRIEPI)
Abstract
Forward voltage drops of carbon implanted and thermal oxidized pin diode with thick drift layer are investigated to evaluate the effect on the lifetime. The forward voltage drops of the carbon implanted and thermal oxidized pin diodes with drift layer of 120 μm thick were around 4.0 V. Furthermore, blocking characteristics of 4H-SiC pin diodes with mesa-JTE, which were fabricated on C-face and Si-face substrates, are also investigated. The breakdown voltages of pin diodes with 250 μm and 100 μm epitaxial layers are 17.1 kV and 10.9 kV, respectively.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference7 articles.
1. L. Storasta and H. Tsuchida: Appl. Phys. Lett, Vol. 90 (2007), 062116.
2. K. Kawahara, G. Alfieri, T. Hiyoshi, G. Pensl and T. Kimoto: Mater. Sci. Forum, Vols. 645-648 (2010), pp.651-654.
3. Y. Sugawara, D. Takayama, K. Asano, R. Singh, J. Palmour and T. Hayashi: Proceedings of 2001 ISPSD (2001), pp.27-30.
4. M. Ito, L. Storasta and H. Tsuchida: Applied Physics Express, Vol. 1 (2008), 015001.
5. H. Tsuchida, I. Kamata, T. Jikimoto and K. Izumi: J. Crystal Growth, Vols. 237-239, Part 2 (2002), pp.1206-1212.
Cited by
11 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献