Top Seeded Solution Growth of 3C-SiC Single Crystals

Author:

Mercier Frédéric1,Chaussende Didier2ORCID,Dedulle Jean Marc3,Pons Michel3,Madar Roland2

Affiliation:

1. National Institute of Advanced Industrial Science and Technology (AIST)

2. UMR CNRS 5628, INP Grenoble-MINATEC

3. Grenoble INP–CNRS-UJF

Abstract

The main problem for the development of 3C-SiC electronics is the lack of an adapted bulk growth process. The seeded sublimation method is not very adapted for the 3C polytype because of the solid-state transition from cubic to hexagonal that occurs at high temperature (above 1800°C). In this paper, we propose a new experimental set-up for the development of a solution route for the growth of high quality 3C-SiC crystals. By a coupled approach involving experiments and global process modeling, we have addressed the problems of dissolution and crystallization, elimination of parasitic nucleation and stabilization of the growth front. With an appropriate control of the different convection mechanisms, a stable growth front is demonstrated, with a growth rate of a few tens of µm/h at 1650°C. Further improvements and potentialities of this approach are discussed.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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