Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model

Abstract

When a physical cleaning technology, such as megasonic and high-velocity-liquid aerosol cleaning, is considered for the removal of particles or photo resist residues, damage addition is a major concern. After detection of defects in long gate stack lines by bright field inspection (KT2800), SEM imaging shows they extend over a length in the order of 1μm (Figure 1) [1].