Chemically controlled megasonic cleaning of patterned structures using solutions with dissolved gas and surfactant

Author:

Sahoo Bichitra Nanda,Han So Young,Kim Hyun-Tae,Ando Keita,Kim Tae-Gon,Kang Bong-Kyun,Klipp Andreas,Yerriboina Nagendra Prasad,Park Jin-Goo

Publisher

Elsevier BV

Subject

Acoustics and Ultrasonics,Radiology, Nuclear Medicine and imaging,Chemical Engineering (miscellaneous),Inorganic Chemistry,Organic Chemistry,Environmental Chemistry

Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Tailored electrostatic attraction force between anionic polymer and Si3N4 film in consecutive gate poly open CMP;Materials Science in Semiconductor Processing;2024-12

2. Monitoring Megasonic Solvent Combination with Temperature;2024 4th International Conference on Innovative Research in Applied Science, Engineering and Technology (IRASET);2024-05-16

3. Effects of Gas-Dissolved Water for Ceria Nanoparticles on the SiO2 Film Surface in Post-CMP Cleaning;ECS Journal of Solid State Science and Technology;2024-05-01

4. Investigation of Cavitation in NaCl Solutions in a Sonochemical Reactor Using the Foil Test Method;Fluid Dynamics & Materials Processing;2024

5. Review—Post-Chemical Mechanical Planarization Cleaning Technology;ECS Journal of Solid State Science and Technology;2023-11-01

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