Affiliation:
1. Chartered Semiconductor Manufacturing Ltd.
Abstract
Megasonic cleaning using de-gassed water (less than 2ppm N2, O2, CO2) in a 300mm batch
immersion tool often does not give optimal particle performance, with particle streaks and clusters
added onto the wafer, and low particle removal efficiency (PRE). When water was re-gasified with
N2, the resultant stable cavitation activity reduced particle adders and increased PRE. With N2
concentration increased to just above 5ppm, number of particle adders decreased by three folds.
Optimal particle performance could be obtained by operating at an N2 level close to saturation.
Publisher
Trans Tech Publications, Ltd.
Subject
Condensed Matter Physics,General Materials Science,Atomic and Molecular Physics, and Optics
Cited by
6 articles.
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