Affiliation:
1. Mattson Technology Canada
2. Mattson Thermal Products GmbH
Abstract
Millisecond annealing (MSA) has been developed over the last several years as a viable
approach to achieve the high electrical activation, limited diffusion and high abruptness needed for
junctions in the sub-65nm regime. This paper will provide an overview of the technology including
the motivation, technology and some process results. Both main approaches for MSA, sub-melt
laser and flash lamp annealing will be discussed as well as the potential challenges to bring these
technologies into mainstream manufacturing.
Publisher
Trans Tech Publications, Ltd.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献