1. Haran B S, Kumar A, Adam L, et al. 22 nm technology compatible fully functional 0.1 μm 26T-SRAM cell. In: IEDM Tech Dig, 2008. 625–628
2. The International Technology Roadmap for Semiconductors (ITRS) Roadmap. ITRS Roadmap 2007/2008, http://public.itrs.net/
3. Mimotogi S, Satake M, Kitamura Y, et al. Pattering strategy and performance of 1.3 NA tool for 32 nm node lithography. In: Proc of SPIE, San Jose, 2008. 6924: 69240M01–69240M09
4. Lee S S, Wu C H, Huang Y F, et al. Manufacturing implementation of 32 nm SRAM using ArF immersion with RET. In: Proc of SPIE, San Jose, 2008. 6924: 69242X01–69242X10
5. Lin B J. Marching of the microlithography horses: electron, ion, and photon: Past, present, and future. In: Proc of SPIE, San Jose, 2007. 6520: 65200201–65200218