Bulk Growth of Large Area SiC Crystals

Author:

Powell Adrian R.1,Sumakeris Joseph J.1,Khlebnikov Yuri1,Paisley Michael J.1,Leonard R.T.1,Deyneka Eugene1,Gangwal Sumit1,Ambati Jyothi1,Tsevtkov V.1,Seaman Jeff1,McClure Andy1,Horton Chris1,Kramarenko Olek1,Sakhalkar Varad1,O’Loughlin M.2,Burk Albert A.1,Guo J.Q.3,Dudley Michael4,Balkas Elif1

Affiliation:

1. Cree Research, Inc.

2. Cree, Incorporation

3. Stony Brook University

4. State University of New York at Stony Brook

Abstract

The growth of large diameter silicon carbide (SiC) crystals produced by the physical vapor transport (PVT) method is outlined. Methods to increase the crystal diameters, and to turn these large diameter crystals into substrates that are ready for the epitaxial growth of SiC or other non homogeneous epitaxial layers are discussed. We review the present status of 150 mm and 200 mm substrate quality at Cree, Inc. in terms of crystallinity, dislocation density as well as the final substrate surface quality.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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