Fabrication of 6-nm-Sized Nanodot Arrays with 12 nm-Pitch along Guide Lines Using both Self-Assembling and Electron Beam-Drawing for 5 Tbit/in2 Magnetic Recording

Abstract

A possibility to fabricate nanodot arrays with a dot size of <10 nm="" and="" a="" dot="" pitch="" of="" 12="" along="" guide="" lines="" has="" been="" studied="" for="" ultrahigh-density="" patterned="" media="" in="" magnetic="" recording="" this="" was="" by="" using="" self-assembling="" block="" copolymers="" polystyrene-poly="" dimethyl="" siloxane="" ps-pdms="" electron="" beam="" eb="" drawing="" with="" hydrogen="" silsesquioxane="" hsq="" negative="" resist="" their="" fusion="" method="" it="" demonstrated="" that="" the="" could="" possibly="" achieve="" 6-nm-sized="" nanodot="" arrays="" 10="" 4="" x="" sup="">2 using self-assembling with PS-PDMS of molecular weight 7000-1500 and EB-drawing for narrow guide lines. These results prove that the fusion method is required for achieving extremely small dot arrays as 5 Tbit/in2magnetic storage devices.Keywords: Nanodot, self-assembly, electron-beam drawing, graphoepitaxy, patterned media, magnetic recording.