Polymer Self-Assembly as a Novel Extension to Optical Lithography
Author:
Affiliation:
1. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn7002663
Reference25 articles.
1. Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries
2. Block Copolymers—Designer Soft Materials
3. Polymer self assembly in semiconductor microelectronics
4. Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication
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