A novel highly reliable and low-power radiation hardened SRAM bit-cell design
Author:
Affiliation:
1. Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences
2. University of Chinese Academy of Sciences
Publisher
Institute of Electronics, Information and Communications Engineers (IEICE)
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
https://www.jstage.jst.go.jp/article/elex/15/3/15_15.20171129/_pdf
Reference13 articles.
1. [1] E. Ibeet al.: “Impact of scaling on neutron-induced soft error in SRAMs from a 250 nm to a 22 nm design rule,” IEEE Trans. Electron Devices 57 (2010) 1527 (DOI: 10.1109/TED.2010.2047907).
2. [2] J. Guoet al.: “Soft error hardened memory design for nanoscale complementary metal oxide semiconductor technology,” IEEE Trans. Reliab. 64 (2015) 596 (DOI: 10.1109/TR.2015.2410275).
3. [3] R. Rajaeiet al.: “Design of robust SRAM cells against single-event multiple effects for nanometer technologies,” IEEE Trans. Device Mater. Rel. 15 (2015) 429 (DOI: 10.1109/TDMR.2015.2456832).
4. [4] T. Calinet al.: “Upset hardened memory design for submicron CMOS technology,” IEEE Trans. Nucl. Sci. 43 (1996) 2874 (DOI: 10.1109/23.556880).
5. [5] S. M. Jahinuzzamanet al.: “A soft error tolerant 10T SRAM bit-cell with differential read capability,” IEEE Trans. Nucl. Sci. 56 (2009) 3768 (DOI: 10.1109/TNS.2009.2032090).
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