Application of Microwave Photoconductivity Decay Method to Characterization of Amorphous In-Ga-Zn-O Films

Author:

YASUNO Satoshi12,KITA Takashi2,MORITA Shinya3,HINO Aya3,HAYASHI Kazushi3,KUGIMIYA Toshihiro3,SUMIE Shingo1

Affiliation:

1. Kobelco Research Institute, Inc.

2. Kobe University

3. KOBE STEEL, LTD.

Publisher

Institute of Electronics, Information and Communications Engineers (IEICE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Reference23 articles.

1. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

2. Amorphous Oxide Semiconductors for High-Performance Flexible Thin-Film Transistors

3. [3] H. Yabuta, M. Sano, K. Abe, T. Aiba, T. Den, H. Kumoni, K. Nomura, T. Kamiya, and H. Hosono, “High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering,” Appl. Phys. Lett., vol.89, 112123, 2006.

4. [4] J.K. Jeong, J.H. Jeong, H.W. Yang, J.-S. Park, Y.-G. Mo, and H.D. Kim, “High performance thin film transistors with cosputtered amorphous indium gallium zinc oxide channel,” Appl. Phys. Lett., vol.91, 113505, 2007.

5. [5] K. Nomura, T. Kamiya, H. Ohta, M. Hirano, and H. Hosono, “Defect passivation and homogenization of amorphous oxide thin-film transistor by wet O2 annealing,” Appl. Phys. Lett., vol.93, 192107, 2009.

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