Nitrogen Adsorption of Si(100) Surface by Plasma Excited Ammonia
Author:
Affiliation:
1. Yamagata University
Publisher
Institute of Electronics, Information and Communications Engineers (IEICE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
https://www.jstage.jst.go.jp/article/transele/E98.C/5/E98.C_395/_pdf
Reference37 articles.
1. [1] H. P. Maruska, D. A. Stevenson, and J. I. Pankove, “Violet luminescence of Mg-doped GaN,” Appl. Phys. Lett., vol.22, no.6, pp.303–305, Mar. 1973.
2. [2] S. Nakamura, M. Senoh, and T. Mukai, “P-GaN/n-InGaN/n-GaN double-heterostructure blue-light-emitting diodes,” Jpn. J. Appl. Phys., vol.32(Part 2, No.1A/B), pp.L8–L11, Jan. 1993.
3. [3] O. Ambacher, J. Smart, J. R. Shealy, N. G. Weimann, K. Chu, M. Murphy, W. J. Schaff, L. F. Eastman, R. Dimitrov, L. Wittmer, M. Stutzmann, W. Rieger, and J. Hilsenbeck, “Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures,” J. Appl. Phys., vol.85, no.6, pp.3222–3233, Mar. 1999.
4. [4] M. Trivedi and K. Shenai, “Performance evaluation of high-power wide band-gap semiconductor rectifiers,” J. Appl. Phys., vol.85, no.9, pp.6889–6897, May 1999.
5. [5] T. G. Zhu, D. J. H. Lambert, B. S. Shelton, M. M. Wong, U. Chowdhury, H. K. Kwon, and R. D. Dupuis, “High-voltage GaN pin vertical rectifiers with 2 μm thick i-layer,” Electron. Lett., vol.36, no.23, pp.1971–1972, Nov. 2000.
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Plasma power effect on crystallinity and density of AlN films deposited by plasma enhanced atomic layer deposition;Journal of Materials Research and Technology;2023-11
2. Effect of substrate temperature on properties of AlN buffer layer grown by remote plasma ALD;Surfaces and Interfaces;2023-02
3. Plasma Power Effect on Crystallinity and Density of Peald-Aln Thin Films： Toward Increasing Dielectric Constant and Breakdown Electric Field;2023
4. Accelerated oxygen evolution kinetics on Ir-doped SrTiO3 perovskite by NH3 plasma treatment;Chinese Physics B;2022-11-01
5. Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds;Langmuir;2020-10-21
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3