Plasma power effect on crystallinity and density of AlN films deposited by plasma enhanced atomic layer deposition-Reference-Cited by-同舟云学术

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Plasma power effect on crystallinity and density of AlN films deposited by plasma enhanced atomic layer deposition

Published:2023-11 Issue: Volume:27 Page:4213-4223
ISSN:2238-7854
Container-title:Journal of Materials Research and Technology
language:en
Short-container-title:Journal of Materials Research and Technology

Author:

Zhang Xiao-Ying,Peng Duan-Chen,Yan Jia-Hao,Zhang Zhi-Xuan,Ruan Yu-Jiao,Zuo Juan,Xie An,Wu Wan-Yu,Wuu Dong-Sing,Huang Chien-Jung,Lai Feng-Min,Lien Shui-Yang^ORCID,Zhu Wen-Zhang

Publisher

Elsevier BV

Subject

Metals and Alloys,Surfaces, Coatings and Films,Biomaterials,Ceramics and Composites

Reference52 articles.

1. PEALD AlN: controlling growth and film crystallinity;Banerjee;Phys Status Solidi C,2015

2. Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode;Chang;Light Sci Appl,2022

3. 263 nm wavelength UV-C LED on face-to-face annealed sputter-deposited AlN with low screw- and mixed-type dislocation densities;Uesugi;APEX,2022

4. Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS;Strnad;J Vac Sci Technol A,2022

5. CMOS-integrated aluminum nitride MEMS: a Review;Pinto;J Microelectromech Syst,2022

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