High-Throughput Electron Beam Direct Writing of VIA Layers by Character Projection with One-Dimensional VIA Characters-Reference-Cited by-同舟云学术

High-Throughput Electron Beam Direct Writing of VIA Layers by Character Projection with One-Dimensional VIA Characters

Published:2013 Issue:12 Volume:E96.A Page:2458-2466
ISSN:0916-8508
Container-title:IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences
language:en
Short-container-title:IEICE Trans. Fundamentals

Author:

IKENO Rimon¹,MARUYAMA Takashi²,KOMATSU Satoshi¹,IIZUKA Tetsuya³,IKEDA Makoto¹,ASADA Kunihiro¹

Affiliation:

1. VLSI Design and Education Center (VDEC), The University of Tokyo

2. e-Shuttle, Inc.

3. Department of Electrical Engineering and Information Systems, Graduate School of Engineering, The University of Tokyo

Publisher

Institute of Electronics, Information and Communications Engineers (IEICE)

Subject

Applied Mathematics,Electrical and Electronic Engineering,Computer Graphics and Computer-Aided Design,Signal Processing

Link

https://www.jstage.jst.go.jp/article/transfun/E96.A/12/E96.A_2458/_pdf

Reference20 articles.

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2. [2] H.C. Pfeiffer, “Recent advances in electron-beam lithography for the high-volume production of VLSI devices,” IEEE Trans. Electron Devices, vol.ED-26, no.4, pp.663-674, April 1979.

3. [3] A. Yamada, H. Yasuda, and M. Yamabe, “Electron beams in individual column cells of multicolumn cell system,” J. Vac. Sci. Technol., B, vol.26, no.6, pp.2025-2031, Nov./Dec. 2008.

4. [4] R. Inanami, S. Magoshi, S. Kosai, M. Hamada, T. Takayanagi, K. Sugihara, K. Okumura, and T. Kuroda, “Throughput enhancement strategy of maskless electron beam direct writing for logic device,” Proc. 2000 IEEE International Electron Devices Meeting, pp.833-836, Dec. 2000.

5. [5] M. Sugihara, T. Takata, K. Nakamura, R. Inanami, H. Hayashi, K. Kishimoto, T. Hasebe, Y. Kawano, Y. Matsunaga, K. Murakami, and K. Okumura, “Cell library development methodology for throughput enhancement of character projection equipment,” IEICE Trans. Electron., vol.E89-C, no.3, pp.377-383, March 2006.

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1. A Structured Routing Architecture for Practical Application of Character Projection Method in Electron-Beam Direct Writing;IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences;2014