Letter: Thermal Decomposition of Methyltrichlorosilane, Dimethyldichlorosilane and Methyldichlorosilane by Flash Pyrolysis Vacuum Ultraviolet Photoionization Time-of-Flight Mass Spectrometry

Abstract

The thermal decompositions of methyltrichlorosilane (MTS) (CH3SiCl3), dimethyldichlorosilane (Si(CH3)2Cl2), and methyldichlorosilane (SiHCH3Cl2) were studied at temperatures from ∼1000 K to 1500 K on a short timescale of 20 μs to 100 μs using flash pyrolysis vacuum ultraviolet single-photon ionization time-of-flight mass spectrometry. The pyrolysis of MTS proceeds primarily via Si–C bond homolysis to form the SiCl3 and methyl radicals. At elevated temperatures, SiCl2 production from secondary decomposition of SiCl3 becomes more important, and other pyrolysis pathways of MTS, including C–H bond fission and HCl elimination make minor contributions. The pyrolysis of Si(CH3)2Cl2 occurs mainly by the sequential loss of methyl radicals, ultimately forming a significant amount of SiCl2. Si(CH3)2Cl2 also has two minor decomposition channels at higher temperatures, molecular elimination of CH4 to form SiCH2Cl2 and of CH3Cl to form SiCH3Cl. The pyrolysis of SiHCH3Cl2 mainly undergoes sequential CH3 and H loss and/or molecular elimination of CH4 to form SiCl2, while molecular elimination of HCl to form SiCH3Cl also contributes. SiCl2 is produced in significant concentrations in the pyrolysis of all three molecules, suggesting that it is an important intermediate in SiC chemical vapor deposition from chloroorganosilanes.