Abstract
Abstract
In this paper, we propose an effective method for optimizing mask design using an enhanced genetic algorithm (GA), significantly boosting digital micromirror device (DMD) maskless lithography performance. After a thorough evaluation of various optimization techniques, we determined that the simulated annealing-enhanced GA (SA-GA) offers superior improvements in lithography simulations, thus optimizing mask design more effectively. Our findings reveal that this method achieves up to 88% and 75% enhancement in simulation accuracy for circular and heart-shaped patterns, respectively, surpassing the results of conventional Hopkins lithography simulations. The remarkable effect of improved GA in enhancing the quality of DMD digital lithography shows that it will have great potential in micro-fabrication applications, and paves the way for the realization of high-fidelity and efficient DMD digital lithography technology, which has excellent versatility and adaptability in the field of microelectronics manufacturing.
Funder
Anhui Province college young and middle-aged teachers training action project
Key Research and development program of Anhui Province
National Natural Science Foundation of China
Natural Science Foundation of Anhui Province
China Postdoctoral Science Foundation
Major Project of Natural Science Study in Universities of Anhui Province
Research activities of postdoctoral researchers in Anhui Province
Open Project of Special Display and Imaging Technology Innovation Center of Anhui Province
Anhui Polytechnic University Graduate Education Innovation Fund and the New Era Education Quality Project (Postgraduate Education).
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1 articles.
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