Maskless lithography based on digital micromirror device (DMD) and double sided microlens and spatial filter array
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference23 articles.
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2. Maskless electron beam lithography: prospects, progress, and challenges;Groves;Microelectron. Eng.,2002
3. E-beam lithography for micro/nano fabrication;Altissimo;Biomicrofluidics,2010
4. Ion beam nanoscale fabrication and lithography – a review;Baglin;Appl. Surf. Sci.,2012
5. Interference lithography: a powerful tool for fabricating periodic structures;Lu;Laser Photon. Rev.,2010
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