Deep learning-driven digital inverse lithography technology for DMD-based maskless projection lithography-Reference-Cited by-同舟云学术

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Deep learning-driven digital inverse lithography technology for DMD-based maskless projection lithography

Published:2025-01 Issue: Volume:180 Page:111578
ISSN:0030-3992
Container-title:Optics & Laser Technology
language:en
Short-container-title:Optics & Laser Technology

Author:

Chen Jing-Tao,Zhao Yuan-Yuan^ORCID,Guo Xu,Duan Xuan-Ming^ORCID

Publisher

Elsevier BV

Reference37 articles.

1. Submicrometer-scale pattern generation via maskless digital photolithography;Kang;Optica,2020

2. λ/12 super resolution achieved in maskless optical projection nanolithography for efficient cross-scale patterning;Liu;Nano Letters,2021

3. Photonic crystal L3 cavity laser fabricated using maskless digital photolithography;Kang;Nanophotonics,2022

4. Batch fabrication of functional optical elements on a fiber facet using DMD based maskless lithography;Kim;Optics Express,2017

5. Generating an M 2× N 2 spot array with a dual-period hybrid Dammann grating fabricated using maskless projection lithography;Miao;Optics Letters,2023

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