Large area annealing by magnetic field scanning of atmospheric pressure thermal plasma beam
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
https://iopscience.iop.org/article/10.35848/1347-4065/ab7e40/pdf
Reference35 articles.
1. XeCl Excimer Laser Annealing Used to Fabricate Poly-Si TFT's
2. Phase transformation mechanisms involved in excimer laser crystallization of amorphous silicon films
3. Excimer laser-induced temperature field in melting and resolidification of silicon thin films
4. Electrical property of coincidence site lattice grain boundary in location-controlled Si island by excimer-laser crystallization
5. Crystallization to polycrystalline silicon thin film and simultaneous inactivation of electrical defects by underwater laser annealing
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