Populations and propagation behaviors of pure and mixed threading screw dislocations in physical vapor transport grown 4H-SiC crystals investigated using X-ray topography
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
https://iopscience.iop.org/article/10.35848/1347-4065/abab46/pdf
Reference26 articles.
1. Influence of epitaxial growth and substrate-induced defects on the breakdown of 4H–SiC Schottky diodes
2. Relationship between threading dislocation and leakage current in 4H-SiC diodes
3. Influence of Threading Dislocations on Lifetime of Gate Thermal Oxide
4. Formation of basal plane Frank-type faults in 4H-SiC epitaxial growth
5. Structure of the carrot defect in 4H-SiC epitaxial layers
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1. Discrimination of dislocation in highly doped n-type 4H–SiC by combining electrochemical reaction and molten alkali etching;Materials Science in Semiconductor Processing;2024-12
2. In-situ and ex-situ characterizations of PVT-grown 4H-SiC single crystals;Journal of Physics D: Applied Physics;2024-09-03
3. 3D structure of threading screw dislocation at a deep location in 4H-SiC using 3D micro-X-ray topography;Japanese Journal of Applied Physics;2024-01-04
4. Non-destructive identification of edge-component burgers vector of threading dislocations in SiC wafers by birefringence imaging;Diamond and Related Materials;2023-10
5. Nucleation of Threading Dislocations in 4H-SiC at Early Physical-Vapor-Transport Growth Stage;Crystal Growth & Design;2023-06-05
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