Abstract
Abstract
For improving self-heating effect (SHE) in Ge vertically stacked gate-all-around (GAA) nanowire (NW) p-type metal-oxide-semiconductor field-effect transistor (pMOSFET), aluminum oxide (Al2O3, alumina) is utilized for gate dielectric layer. From the high thermal conductivity of Al2O3, SHE is significantly improved. In order to validate the proposed device structure, technology computer-aided design simulation is performed through Synopsys Sentaurus three-dimensional tool. As a result, when Al2O3 is incorporated in Ge vertically stacked GAA NW pMOSFET, SHE can be remarkably improved from 534 to 419 K. In addition, the method of simultaneously accomplishing improvement of SHE and low gate leakage current (I
gate) have been specifically investigated and proposed with numerous simulation data.
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
6 articles.
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