Ozone based high-temperature atomic layer deposition of SiO2thin films
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
https://iopscience.iop.org/article/10.35848/1347-4065/ab78e4/pdf
Reference40 articles.
1. SiO2 Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy
2. Low temperature atomic layer deposition of SiO2 thin films using di-isopropylaminosilane and ozone
3. High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical
4. Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
5. High performance SONOS flash memory with in-situ silicon nanocrystals embedded in silicon nitride charge trapping layer
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1. Pyridine-Catalyzed Atomic Layer Deposition of SiO2 from Hexachlorodisilane and Water: An In Situ Mechanistic Study;Chemistry of Materials;2023-05-09
2. High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane;Journal of Vacuum Science & Technology A;2022-03
3. Atomic layer chemical vapor deposition of SiO2 thin films using a chlorine-free silicon precursor for 3D NAND applications;Ceramics International;2021-07
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