Stitching error compensation for large-area microstructures based on digital oblique scanning exposure mode

Abstract

Abstract We proposed an efficient method for improving the stitching precision of large-area microstructures. A clever triangular region compensation strategy based on a digital micromirror device oblique scanning exposure mode was developed, which can effectively enhance lithographic resolution and complete seamless stitching. In order to ensure the optimal stitching effect, the stage self-calibration technology was also introduced into the exposure system. The experimental results showed that the stitching region traces can be effectively eliminated and smoothed by the above strategy. The presented method will have important applications in the printed circuit board and flat panel display fields.