Study on Physical Properties of Organic Resist Spacers on Color Filters
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
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1. Relationship between C=C double bond conversion and dissolution kinetics in cross-linking-type photoresists for display manufacture, studied by real-time Fourier transform infrared spectroscopy and quartz crystal microbalance methods;JPN J APPL PHYS;2018
2. Relationship between C=C double bond conversion and dissolution kinetics in cross-linking-type photoresists for display manufacture, studied by real-time Fourier transform infrared spectroscopy and quartz crystal microbalance methods;Japanese Journal of Applied Physics;2018-07-25
3. Dissolution behavior of negative-type photoresists for display manufacture studied by quartz crystal microbalance method;Japanese Journal of Applied Physics;2018-02-26
4. Preparation and Photo- and Thermal-Curing Properties of Copolymers Applied in Negative-Type Photoresists;Molecular Crystals and Liquid Crystals;2011-10-07
5. Effect of the Addition of Acrylic Monomers on Mechanical Properties of Patterns Applied in Negative-Type Photoresists;Molecular Crystals and Liquid Crystals;2010-06-21
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