Relationship between C=C double bond conversion and dissolution kinetics in cross-linking-type photoresists for display manufacture, studied by real-time Fourier transform infrared spectroscopy and quartz crystal microbalance methods-Reference-Cited by-同舟云学术

Relationship between C=C double bond conversion and dissolution kinetics in cross-linking-type photoresists for display manufacture, studied by real-time Fourier transform infrared spectroscopy and quartz crystal microbalance methods

Published:2018-07-25 Issue:9 Volume:57 Page:096501
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Tsuneishi Asuka,Uchiyama Sachiyo,Hayashi Ryouta,Taki Kentaro,Kozawa Takahiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/57/i=9/a=096501/pdf

Reference34 articles.

1. Colour filters for LCDs

2. Color filter technology for liquid crystal displays

3. Chemical Amplification Resists for Microlithography

4. Study on Physical Properties of Organic Resist Spacers on Color Filters

5. Preparation and characterization of nanosilica-filled color resist

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