Effect of the Addition of Acrylic Monomers on Mechanical Properties of Patterns Applied in Negative-Type Photoresists
Author:
Affiliation:
1. a Department of Chemical and Materials Engineering , National Central University , Taoyuan County, Taiwan
Publisher
Informa UK Limited
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Link
https://www.tandfonline.com/doi/pdf/10.1080/15421406.2010.484609
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5. Synthesis and photosensitivity of acryloylmorpholine copolymers with a pendant (meth)acryloyl group
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